Acta Metallurgica Sinica (English Letters) ›› 2022, Vol. 35 ›› Issue (10): 1744-1758.DOI: 10.1007/s40195-022-01407-5
Khalil Rehman1,2, Naicheng Sheng1(), Shigang Fan1, Shijie Sun1, Guicheng Hou1, Yizhou Zhou1, Xiaofeng Sun1
Received:
2021-09-22
Revised:
2021-12-27
Accepted:
2021-12-27
Online:
2022-04-08
Published:
2022-04-08
Contact:
Naicheng Sheng
About author:
Naicheng Sheng, ncsheng@imr.ac.cnKhalil Rehman, Naicheng Sheng, Shigang Fan, Shijie Sun, Guicheng Hou, Yizhou Zhou, Xiaofeng Sun. Improved Spallation Resistance of the Oxide Scale by Hf/Y Co-doping in Ni-Based Superalloy at High Temperature[J]. Acta Metallurgica Sinica (English Letters), 2022, 35(10): 1744-1758.
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Alloy | Ni | Co | Cr | Al | Mo + W + Ta + Re | Hf | Y | B | C |
---|---|---|---|---|---|---|---|---|---|
Hf/Y-doped | Bal | 7.5 | 7 | 6.1 | 16 | 0.099 | 0.04 | 0.004 | 0.05 |
Hf-doped | Bal | 7.5 | 7 | 6.1 | 16 | 0.13 | 0 | 0.004 | 0.05 |
Undoped | Bal | 7.5 | 7 | 6.1 | 16 | 0 | 0 | 0.004 | 0.05 |
Table 1 Elemental composition of the base alloys (in wt%) measured with ICP technique
Alloy | Ni | Co | Cr | Al | Mo + W + Ta + Re | Hf | Y | B | C |
---|---|---|---|---|---|---|---|---|---|
Hf/Y-doped | Bal | 7.5 | 7 | 6.1 | 16 | 0.099 | 0.04 | 0.004 | 0.05 |
Hf-doped | Bal | 7.5 | 7 | 6.1 | 16 | 0.13 | 0 | 0.004 | 0.05 |
Undoped | Bal | 7.5 | 7 | 6.1 | 16 | 0 | 0 | 0.004 | 0.05 |
Alloy | Temperature (°C) | ||
---|---|---|---|
900 | 1000 | 1100 | |
Hf/Y-doped | 1.59 × 10-5 | 1.16 × 10-4 | 5.62 × 10-3 |
Hf-doped | 6.50 × 10-6 | 7.81 × 10-5 | 2.71 × 10-3 |
Undoped | 3.86 × 10-7 | 1.68 × 10-6 | 5.62 × 10-3 |
Table 2 Oxidation rate constant k (mgn cm-2n h-1) values for the second oxidation stage at 900 °C, 1000 °C, and 1100 °C
Alloy | Temperature (°C) | ||
---|---|---|---|
900 | 1000 | 1100 | |
Hf/Y-doped | 1.59 × 10-5 | 1.16 × 10-4 | 5.62 × 10-3 |
Hf-doped | 6.50 × 10-6 | 7.81 × 10-5 | 2.71 × 10-3 |
Undoped | 3.86 × 10-7 | 1.68 × 10-6 | 5.62 × 10-3 |
Fig. 4 XRD analysis of Hf/Y-doped, Hf-doped, and undoped alloy after 300 h at a 900 °C, b 1000 °C, and c 1100 °C. d-f Enlarged view of Al2O3 peak with 100% intensity highlighted by the dotted lines in a, b, and c, respectively
Fig. 5 Photostimulated luminescence spectra (PSLS) spectra of the oxide scale after oxidation at 1000 °C for different times of a Hf/Y-doped, b Hf-doped, c undoped alloy
Fig. 6 Surface morphology of the oxide scale after 300 h of oxidation at 900 °C with corresponding high-magnification image of dendritic (red square) and interdendritic (yellow square) regions of (a, b, c) Hf/Y-doped, d-f Hf-doped, g-i undoped alloys
Fig. 7 SEM micrograph of the surface oxide after 300 h at 1000 °C of a Hf/Y-doped, c Hf-doped, and e undoped alloy. b, d, f Corresponding high-magnification image is marked with a yellow square in images a, c, e
Fig. 9 SEM micrograph of the surface oxide scale after oxidation time of 300 h at 1100 °C of a Hf/Y-doped, c Hf-doped, and f undoped alloys. e Magnified image of the spalled area in (c). b, d, g Magnified view of yellow square areas in (a, c, f), respectively
Fig. 10 Cross-sectional view of the oxidized alloys a, d, g of Hf/Y-doped alloy, b, e, h Hf-doped, and c, f, i undoped alloy after 300 h at 900, 1000, and 1100 °C, respectively
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