Acta Metallurgica Sinica (English Letters) ›› 2017, Vol. 30 ›› Issue (12): 1231-1235.DOI: 10.1007/s40195-017-0606-3

Special Issue: 2017纳米材料专辑 2017-2018薄膜和涂层专辑

• Orginal Article • Previous Articles     Next Articles

Microstructure and Optical Properties of Ti54.5Ni45.5 Nanocrystalline Thin Film

Xin Zhang1, Jie-He Sui2(), Yong-Chao Lei2, Wei Cai2()   

  1. 1 School of Materials Science and Engineering, Tianjin University of Technology, 300384 Tianjin, China
    2 National Key Laboratory Precision Hot Processing of Metals,Harbin Institute of Technology, 150001 Harbin, China
  • Received:2017-03-09 Revised:2017-04-17 Online:2017-12-20 Published:2018-02-05

Abstract:

Nanocrystalline Ti54.5Ni45.5 thin film was prepared by magnetron sputtering followed by rapid thermal annealing. The film displayed martensite structure and (001) compound twin substructure, and the transformation temperatures M s and A s are 313 and 365 K, respectively. The reflectivity for the wavelength from 200 to 800 nm at 298 and 393 K was investigated, and the results showed that the optical reflectivity contrast between martensite and austensite at 780, 650, 514 and 405 nm was 105.64, 170.83, 112.22 and 149.92%, respectively, which were larger than those of other reported optical recording materials.

Key words: Ti-Ni thin films, Sputtering, Shape memory alloys, Optical properties, Microstructure