Fig. 1 XRD patterns of the mixture (1:2) unmilled a and milled for 20 b, 40 c, 60 d, 80 h e, respectively

Fig. 2 Plots of change of XRD peak intensity of (110) plane of W and amorphous W-B-C(I), and of intensity ratio of W(110) to amorphous W-B-C in mixture (1:2) and mixture (1:5) with milling time

Fig. 3 HRTEM image a and electron diffraction patterns of W along [111] direction and of amorphous W-B-C(I) b for the 80 h-milled mixture (1:2)

Fig. 4 EDS of the selected zone corresponding to electron diffraction pattern of Fig. 3

Fig. 5 XRD patterns of the mixture (1:5) unmilled a and milled for 20 h b, 40 h c, 60 h d, 80 h e

Fig. 6 HRTEM image a and electron diffraction pattern of amorphous W-B-C(II) and W along [113] direction b of the 80 h-milled mixture (1:5)

Fig. 7 EDS of the selected zone corresponding to electron diffraction pattern of Fig. 6

Fig. 8 XRD patterns of the 80 h-milled mixture (1:2) unannealed a and annealed at 900 °C b, 950 °C c, 1200 °C d

Fig. 9 Partial XRD patterns of the mixture (1:2) unannealed a and annealed at 900 °C b, 950 °C c, 1200 °C d

Fig. 10 XRD patterns of the 80 h-milled mixture (1:5) unannealed a and annealed at 900 °C b, 950 °C c, 1200 °C d

Fig. 11 Partial XRD patterns of the mixture (1:5) unannealed a and annealed at 900 °C b, 950 °C c, 1200 °C d