Annealing Effects on Structural, Optical Properties and Laser-Induced Damage Threshold of MgF2 Thin Films

doi:10.1007/s40195-016-0479-x

Abstract

Abstract:

The chemical structures, optical properties and laser-induced damage thresholds of magnesium fluoride films annealed at different temperatures were investigated. The results showed that the stoichiometry of MgF₂ film changed a little with the increase in annealing temperature. Analysis of the optical properties indicated that excellent antireflection behavior of the film in the range of 200-400 nm can be obtained by the samples coated with MgF₂ film. The refractive index increased and the extinction coefficient decreased with increasing annealing temperature. Compared with the as-deposited films, the laser-induced damage threshold was improved after annealing process and decreased with the increase in annealing temperature, which was probably due to the denser film and more absorption centers under higher annealing temperature.

Key words: Annealing temperature, Chemical structure, Optical properties, Laser-induced damage threshold (LIDT), MgF₂ films

Ting-Ting Tan,Bang-Jie Liu,Zhi-Hui Wu,Zheng-Tang Liu. Annealing Effects on Structural, Optical Properties and Laser-Induced Damage Threshold of MgF₂ Thin Films[J]. Acta Metallurgica Sinica (English Letters), 2017, 30(1): 73-78.

Figures/Tables 6

Fig. 1 XRD patterns of MgF2 films annealed at different temperatures

Fig. 2 XPS spectra of MgF2 films annealed at different temperatures: a Mg 2p core-level spectra, b F 1s core-level spectra, c O 1s core-level spectra

Fig. 3 Transmittance spectra of the bare JGS1 substrate and the substrates with MgF2 films annealed at different temperatures

Fig. 4 Refractive index n (a) and extinction coefficient k (b) for the as-deposited and thermal annealed (200-400 °C) thin films determined by spectroscopic ellipsometry

Fig. 5 LIDTs of MgF2 thin films annealed at different temperatures

Fig. 6 Damage morphologies of MgF2 thin films annealed at different temperatures: a as-deposited, b 200 °C, c 300 °C, d 400 °C

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Annealing Effects on Structural, Optical Properties and Laser-Induced Damage Threshold of MgF₂ Thin Films

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