[1] |
Yan?Ming Liu, Tong Li, Feng Liu, Zhi-Liang Pei.
Thermal Stability of WB2 and W-B-N Films Deposited by Magnetron Sputtering
[J]. Acta Metallurgica Sinica (English Letters), 2019, 32(1): 136-144.
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[2] |
Di Fan, Hao Lei, Chao-Qian Guo, Dong-Li Qi, Jun Gong, Chao Sun.
Stress Study on CrN Thin Films with Different Thicknesses on Stainless Steel
[J]. Acta Metallurgica Sinica (English Letters), 2018, 31(3): 329-336.
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[3] |
Tie-Gang Wang, Yu Dong, Belachew Abera Gebrekidan, Yan-Mei Liu, Qi-Xiang Fan, Kwang Ho Kim.
Microstructure and Properties of the Cr-Si-N Coatings Deposited by Combining High-Power Impulse Magnetron Sputtering (HiPIMS) and Pulsed DC Magnetron Sputtering
[J]. Acta Metallurgica Sinica (English Letters), 2017, 30(7): 688-696.
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[4] |
Katarzyna Siuzdak, Mariusz Szkoda, Jakub Karczewski, Jacek Ryl, Kazimierz Darowicki, Katarzyna Grochowska.
Fabrication and Significant Photoelectrochemical Activity of Titania Nanotubes Modified with Thin Indium Tin Oxide Film
[J]. Acta Metallurgica Sinica (English Letters), 2017, 30(12): 1210-1220.
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[5] |
Fa-Yu Wu,Jian-Wei Li,Yi Qi,Wu-Tong Ding,Yuan-Yuan Guo,Yan-Wen Zhou.
Characteristics of the Structure and Properties of ZnSnO3 Films by Varying the Magnetron Sputtering Parameters
[J]. Acta Metallurgica Sinica (English Letters), 2016, 29(9): 827-833.
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[6] |
Li-Jing Huang, Nai-Fei Ren, Bao-Jia Li, Ming Zhou.
Effect of Annealing on the Morphology, Structure and Photoelectric Properties of AZO/Pt/FTO Trilayer Films
[J]. Acta Metallurgica Sinica (English Letters), 2015, 28(3): 281-288.
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[7] |
Dong Xie, Feng Wen, Wenmao Yang, Xueyuan Li, Yongxiang Leng, Guojiang Wan, Hong Sun, Nan Huang.
Carbon-Doped Titanium Oxide Films by DC Reactive Magnetron Sputtering Using CO2 and O2 as Reactive Gas
[J]. Acta Metallurgica Sinica (English Letters), 2014, 27(2): 239-244.
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[8] |
Xiangyang Chen, Jin Zhang, Shengli Ma, Haixia Hu, Zhebo Zhou .
Microstructure, Mechanical, and Tribological Properties of CN x Thin Films Prepared by Reactive Magnetron Sputtering
[J]. Acta Metallurgica Sinica (English Letters), 2014, 27(1): 31-36.
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[9] |
Yuelan DI,Zhihai CAI, Ping ZHANG, Zhen YANG, Qi LI,Wei SHEN .
Tribological behavior of magnetron sputtering CrMoN/MoS2 composite coatings
[J]. Acta Metallurgica Sinica (English Letters), 2012, 25(6): 461-468.
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[10] |
D.Chen.
THE PREPARATION AND CHARACTERISTICS STUDY OF TiNxOy SPECTRAL SELECTIVE ABSORBING FILM BY MAGNETRON SPUTTERING
[J]. Acta Metallurgica Sinica (English Letters), 2005, 18(3): 385-388 .
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[11] |
J.Lee.
MICROSTRUCTURE AND PROPERTIES OF ANNEALED ZnO THIN FILMS DEPOSITED BY MAGNETRON SPUTTERING
[J]. Acta Metallurgica Sinica (English Letters), 2005, 18(3): 177-183 .
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[12] |
H.Q.Wang.
OPTICAL CHARACTERIZATION OF TiO2 THIN FILM ON SILICON SUBSTRATE DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING
[J]. Acta Metallurgica Sinica (English Letters), 2005, 18(3): 194-198 .
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[13] |
L.Z.Ouyang, C.Y.Chung, M.Q.Zeng, H.Wang, M.Zhu.
Mg—Ni THIN FILM—A POTENTIAL NEGATIVE ELECTRODE FOR NIKEL—METAL HYDRIDE BATTERY
[J]. Acta Metallurgica Sinica (English Letters), 2003, 16(3): 226-230 .
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[14] |
F.P. Wang, P. Wu, L.Q. Pan.
THE EFFECTS OF SPUTTERING POWER ON STRUCTURE AND ELECTRICAL PROPERTIES OF Cu FILMS
[J]. Acta Metallurgica Sinica (English Letters), 2002, 15(2): 215-220 .
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[15] |
P.Wu, F.P.Wang, L.Q.Pan.
EFFECT OF Ar PRESSURE ON STRUCTURAL AND ELECTRICAL PROPERTIES OF Cu FILMS DEPOSITED ON GLASS BY DC MAGNETRON SPUTTERING
[J]. Acta Metallurgica Sinica (English Letters), 2002, 15(1): 39-44 .
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