Acta Metallurgica Sinica (English Letters) ›› 2015, Vol. 28 ›› Issue (3): 281-288.DOI: 10.1007/s40195-014-0194-4
• Orginal Article • Next Articles
Li-Jing Huang1,2(), Nai-Fei Ren2,3(), Bao-Jia Li1,2, Ming Zhou1,2
Received:
2014-04-09
Revised:
2014-07-30
Online:
2015-01-07
Published:
2015-07-23
Li-Jing Huang, Nai-Fei Ren, Bao-Jia Li, Ming Zhou. Effect of Annealing on the Morphology, Structure and Photoelectric Properties of AZO/Pt/FTO Trilayer Films[J]. Acta Metallurgica Sinica (English Letters), 2015, 28(3): 281-288.
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Fig. 1 SEM images of the as-deposited AZO/Pt/FTO film: a top view (the inset shows the particle size distribution on the film surface); b cross-sectional view
Fig. 2 SEM images of a-c the one-step-annealed, d-f the layer-by-layer-annealed AZO/Pt/FTO films at various temperatures: a, d 300 °C; b, e 400 °C; c, f 500 °C. The insets show the particle size distributions on the film surfaces
Fig. 3 AFM images of the as-deposited AZO/Pt/FTO film a, the one-step-annealed AZO/Pt/FTO film at 400 °C b, the layer-by-layer-annealed AZO/Pt/FTO film at 400 °C c
Fig. 5 a XRD patterns of the as-deposited AZO/Pt/FTO trilayer film and the layer-by-layer-annealed AZO/Pt/FTO trilayer films at various temperatures; b XRD patterns of the as-deposited AZO/Pt/FTO trilayer film and the AZO/Pt/FTO trilayer films annealed at 400 °C by two approaches
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