Carbon-Doped Titanium Oxide Films by DC Reactive Magnetron Sputtering Using CO2 and O2 as Reactive Gas

doi:10.1007/s40195-014-0049-z

Acta Metallurgica Sinica (English Letters) ›› 2014, Vol. 27 ›› Issue (2): 239-244.DOI: 10.1007/s40195-014-0049-z

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Carbon-Doped Titanium Oxide Films by DC Reactive Magnetron Sputtering Using CO₂ and O₂ as Reactive Gas

Dong Xie^1,², Feng Wen³, Wenmao Yang⁴, Xueyuan Li⁴, Yongxiang Leng²(), Guojiang Wan², Hong Sun², Nan Huang²

1. School of Physical Science and Technology, Southwest Jiaotong University, Chengdu, 610031, China
2. Key Laboratory for Advanced Technologies of Materials, Ministry of Education, School of Materials Science and Engineering, Southwest Jiaotong University, Chengdu, 610031, China
3. Key Laboratory of Tropical Biological Resource of Chinese Educational Ministry, School of Materials and Chemical Engineering, Hainan University, Haikou, 570228, China
4. Institute of Mechanical Manufacturing Technology, China Academy of Engineering Physics, Mianyang, 621900, China

Received:2013-04-27 Revised:2013-10-31 Online:2014-04-25 Published:2014-05-07

Abstract

Abstract:

CO₂ and O₂ were employed as reactive gases to fabricate carbon-doped titanium oxide films using DC reactive magnetron sputtering. Microstructure, composition and optical band gap of the films were investigated by X-ray diffraction, X-ray photoelectron spectroscopy, and UV–visible spectrophotometer, respectively. The results showed that carbon-doped titanium monoxide films (C-TiO) with a carbon concentration of 5.8 at.% were obtained in an Ar/CO₂ mixed atmosphere. However, carbon-doped rutile and anatase (C-TiO₂) with a carbon concentration of about 1.4 at.% were obtained in an Ar/CO₂/O₂ mixed atmosphere. The optical band gaps of C-TiO and C-TiO₂ were about 2.6 and 2.9 eV, respectively. Both of them were narrower than that of pure TiO₂ films. Films with narrowed optical band gap energy are promising in promoting their photo-catalytic activity.

Key words: Carbon-doped titanium oxide films, Optical band gap, DC reactive magnetron sputtering

Dong Xie, Feng Wen, Wenmao Yang, Xueyuan Li, Yongxiang Leng, Guojiang Wan, Hong Sun, Nan Huang. Carbon-Doped Titanium Oxide Films by DC Reactive Magnetron Sputtering Using CO₂ and O₂ as Reactive Gas[J]. Acta Metallurgica Sinica (English Letters), 2014, 27(2): 239-244.

Figures/Tables 9

Table 1 Deposition parameters of Carbon-doped titanium oxide films preparation

Sample	Ar flow rate (L/min)	CO₂ flow rate (L/min)	O₂ flow rate (L/min)	Target current (A)	Substrate bias voltage (V)	Deposition time (min)
No. 1	60	18	–	3	-150	15
No. 2	60	18	6	3	-150	15
No. 3	60	–	18	3	-150	15

Fig. 1 XRD patterns of the films in a grazing angle of θ = 0.5° configuration

Fig. 2 C1s XPS spectra, Ar+ etching time is 180 s

Fig. 3 Depth profile of C1s XPS spectra of No. 1 sample for various Ar+ etching times

Fig. 4 Ti 2p XPS spectra of the films, Ar+ etching time is 180 s

Fig. 5 O1s XPS spectra of the films, Ar+ etching time is 180 s

Table 2 Concentrations of Ti, O, and C in the fabricated films calculated by XPS depth profile spectrum, Ar+ etching time is 180 s

Sample	C (at.%)	Ti (at.%)	O (at.%)	O/Ti ratio
No. 1	5.8	41.7	52.5	1.25
No. 2	1.4	37.4	61.3	1.62
No. 3	–	32.7	67.3	2.04

Fig. 6 Transmission spectra of the films deposited on glass substrates

Fig. 7 Plots of photon energy Evs. (α · E)1/12.2

References 30

[1]	F. Han, V. Kambala, M. Srinivasan, D. Rajarathnam, R. Naidu, Appl. Catal. A 359, 25(2009)10.1016/j.apcata.2009.02.043
[2]	X. Zhao, Q. Zhao, J. Yu, B. Liu, J. Non-Cryst. Solids 354, 1424(2008)10.1016/j.jnoncrysol.2006.10.093
[3]	M. Takeuchi, S. Sakai, A. Ebrahimi, M. Matsuoka, M. Anpo, Top. Catal. 52, 1651(2009)10.1007/s11244-009-9300-7
[4]	X. Chen, S.S. Mao, Chem. Rev. 107, 2891(2007)10.1021/cr0500535
[5]	Y. Park, W. Kim, H. Park, T. Tachikawa, T. Majima, W. Choi, Appl. Catal. B 91, 355(2009)10.1016/j.apcatb.2009.06.001
[6]	R. Leary, A. Westwood, Carbon 49, 741(2011)10.1016/j.carbon.2010.10.010
[7]	K. Woan, G. Pyrgiotakis, W. Sigmund, Adv. Mater. 21, 2233(2009)10.1002/adma.200802738
[8]	T. Tachikawa, S. Tojo, M. Fujitsuka, K. Kawai, M. Endo, T. Ohno, K. Nishijima, Z. Miyamoto, T. Majima, J. Phys. Chem. B 108, 19299(2004)10.1021/jp0470593
[9]	M. Shen, Z. Wu, H. Huang, Y. Du, Z. Zou, P. Yang, Mater. Lett. 60, 693(2006)10.1016/j.matlet.2005.09.068
[10]	B.H.Q. Dang, M. Rahman, D. MacElroy, D.P. Dowling, Surf. Coat. Technol. 206, 4113(2012)10.1016/j.surfcoat.2012.04.003
[11]	B.H.Q. Dang, D. MacElroy, D.P. Dowling, Appl. Surf. Sci. 275, 289(2013)10.1016/j.apsusc.2012.12.121
[12]	U.G. Akpan, B.H. Hameed, Appl. Catal. A 375, 1(2010)10.1016/j.apcata.2009.12.023
[13]	D. Eder, Chem. Rev. 110, 1348(2010)10.1021/cr800433k
[14]	H. Kamisaka, T. Adachi, K. Yamashita, J. Chem. Phys. 123, 084704(2005)10.1063/1.2007630
[15]	Y. Cong, F. Chen, J. Zhang, M. Anpo, Chem. Lett. 35, 800(2006)10.1246/cl.2006.800
[16]	M.S. Wong, S.W. Hsu, K.K. Rao, C.P. Kumar, J. Mol. Catal. A 279, 20(2008)10.1016/j.molcata.2007.09.024
[17]	A. Indarto, D.R. Yang, J.W. Choi, H. Lee, H.K. Song, J. Hazard. Mater. 146, 309(2007)10.1016/j.jhazmat.2006.12.023
[18]	R.X. Li, Q. Tang, S. Yin, Tsugio Sato Fuel Process Technol. 87, 617(2006)10.1016/j.fuproc.2006.01.007
[19]	A. Indarto, J.W. Choi, H. Lee, H.K. Song, Environ. Chem. Lett. 6, 215(2008)10.1007/s10311-008-0160-3
[20]	H. Irie, S. Washizuka, K. Hashimoto, Thin Solid Films 510, 21(2006)10.1016/j.tsf.2005.08.374
[21]	A. Zaleska, Recent Pat. Eng. 2, 157(2008)10.2174/187221208786306289
[22]	Y.X. Leng, J.Y. Chen, J. Wang, G.J. Wan, H. Sun, P. Yang, N. Huang, Surf. Coat. Technol. 201, 157(2006)10.1016/j.surfcoat.2005.11.074
[23]	J. Tauc, Mater. Res. Bull. 3, 37(1968)10.1016/0025-5408(68)90023-8
[24]	J.F.MoulderW.F.StickleP.E.SoolK.D.Bomben, Handbook of X-ray Photoelectron Spectroscopy(Perkin-Elmer, Norwalk, 1992)
[25]	L. Zhang, R.V. Koka, Mater. Chem. Phys. 57, 23(1998)10.1016/S0254-0584(98)00187-4
[26]	Y.X. Leng, P. Yang, J.Y. Chen, L.X. Xu, A.S. Zhao, H. Sun, J. Wang, N. Huang, Key Eng. Mater. 311, 288(2005)
[27]	B. Dai, W.M. Gong, X.L. Zhang, A.M. Zhu, B.A. Zhang, China Environ. Sci. 19, 410(1999)
[28]	B. Eliasson, U. Kogelschatz, IEEE Trans. Plasma Sci. 19, 1063(1991)10.1109/27.125031
[29]	N. Omori, H. Matsuo, S. Watanabe, M. Puschmann, Surf. Sci. 352–354, 988(1996)10.1016/0039-6028(95)01313-X
[30]	R. Asahi, T. Morikawa, T. Ohwaki, K. Aoki, Y. Taga, Science 293, 269(2001)10.1126/science.1061051

Carbon-Doped Titanium Oxide Films by DC Reactive Magnetron Sputtering Using CO₂ and O₂ as Reactive Gas

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