Acta Metallurgica Sinica (English Letters) ›› 1991, Vol. 4 ›› Issue (7): 50-54.

• Research paper • Previous Articles     Next Articles

NETWORK FRACTAL AND ANNEALING-INDUCED AGGREGATION OF Cu/a-C:H BILAYER FILMS

ZHANG Renji Tsinghua University,Beijing,ChinaHe Daren WANG Wangdi Northwestern University,Xi'an,China   

  • Received:1991-07-11 Revised:1991-07-11 Online:1991-07-11 Published:2009-10-10

Abstract: The Cu/a-C:H bilayer films,grown far from the equilibrium,have the network fractal struc- ture.Their fractal dimension value D_f=1.83.An in-situ dynamic observation of these films under TEM at slowly heating rate revealed that the initial network fractal structure was dam- aged gradually and broken down completely at 535℃.And as the annealing-induced aggregation developed,the random dispersed aggregates formed gradually,the fractal dimen- sion of the new structure decreased with increasing annealing temperature.Finally,D_f=1.63 at 850℃.Based on the surface and interface diffusion model of the metallic atoms,the varia- tion of the structural character could be explained.

Key words: Cu film, fractal, annealing-induced aggregation