Acta Metallurgica Sinica (English Letters) ›› 2017, Vol. 30 ›› Issue (10): 999-1007.DOI: 10.1007/s40195-017-0580-9

Special Issue: 2017纳米材料专辑 2017-2018薄膜和涂层专辑

• Orginal Article • Previous Articles     Next Articles

Improvement in Cr Nanoparticle Content in Ni-Cr Film by Co-deposition with Combined Surfactant HPB and CTAB

Li-Juan Qin1(), Yuan-Chao Huang1,2   

  1. 1 Laboratory for Corrosion and Protection, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China
    2 College of Material Science and Engineering, University of Science and Technology of China, Hefei 230026, China
  • Received:2017-04-21 Revised:2017-04-21 Online:2017-10-10 Published:2017-10-11

Abstract:

The effects of single surfactant hexadecylpyridinium bromide (HPB) and cetyltrimethylammonium bromide (CTAB) and the combination of HPB and CTAB on the Cr nanoparticle content in the Ni-Cr film prepared by co-deposition were investigated. Single HPB/CTAB addition inhibited the oxidation and amorphous transformation of the Cr nanoparticles in the plating bath and effectively stabilized the Cr nanoparticles content at approximately 10 mass% as a function of time. Moreover, the combination of HPB and CTAB formed a cylindrical micelle structure on the Cr nanoparticle surface, which prompted the formation of a layer of NiCr2O4. As a result, the Cr nanoparticle content increased sharply to 20 mass%.

Key words: Co-deposition, Ni-Cr film, Cr nanoparticle content, HPB, CTAB