PREPARATION AND SURFACE CHARACTERIZATION OF TiO2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD

Acta Metallurgica Sinica (English Letters) ›› 2002, Vol. 15 ›› Issue (2): 207-209 .

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PREPARATION AND SURFACE CHARACTERIZATION OF TiO2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD

L.S. Yin

College of Information Engineering,Central Sonth University,Changsha 410075,China;Department of Physics,Zhongshan University,Guangzhou 510275,China

Received:2001-07-31 Revised:2001-11-16 Online:2002-04-25 Published:2009-10-10
Contact: L.S. Yin

Abstract

Abstract: Ti thin films were firstly deposited on glass substrates by magnetron sputtering method,then sintered the Ti thin films in air atmosphere and finally TiO2 transparence thinfilms on glass substrates were obtained. The structure and surface morphologies ofthe thin films were characterized by X-ray diffraction and SEM. The growth processof the thin filns has been observed. The annealing time and annealing temperatureshave an affect on the growth of the films.

Key words: TiO2, thin film, magnetron, sputtering

L.S. Yin. PREPARATION AND SURFACE CHARACTERIZATION OF TiO2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD[J]. Acta Metallurgica Sinica (English Letters), 2002, 15(2): 207-209 .

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PREPARATION AND SURFACE CHARACTERIZATION OF TiO2 THIN FILMS ON GLASS BY MAGNETRON SPUTTERING METHOD

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