Role of Substrate Roughness in ZnO Nanowire Arrays Growth by Hydrothermal Approach

doi:10.1007/s40195-016-0383-4

Abstract

Abstract:

The role of substrate roughness in ZnO nanowire (NW) arrays hydrothermal growth has been systematically studied. Six silicon substrates with different roughness by chemical etching have been selected to grow ZnO NW arrays hydrothermally after sputtering 5-nm-thick ZnO seed layer as catalyst. The as-grown samples reveal that average diameters and number densities of ZnO NW arrays are inversely proportional to the increasing substrate roughness observed by atomic-force microscopy and scanning electron microscopy. Furthermore, the theoretically derived equations based on nucleation with the Gibbs free energy to describe relations of substrate roughness versus average NW diameter and NW number density match well with experimental results. Research results in this paper can be used to control the number density and the average diameter of ZnO NW arrays by alternating substrate roughness.

Key words: ZnO nanowire, Chemical synthesis, Atomic-force microscopy, Substrate roughness

Qiu-Hong Wang, Chao-Long Tang, Cheng-Ming Jiang, Dan-Feng Du, Feng Wang, Jin-Hui Song. Role of Substrate Roughness in ZnO Nanowire Arrays Growth by Hydrothermal Approach[J]. Acta Metallurgica Sinica (English Letters), 2016, 29(3): 237-242.

Figures/Tables 4

Fig. 1 AFM measurement for six substrates with different roughness: a 32.0 ± 1.6 nm, b 66.3 ± 3.3 nm, c103.9 ± 5.2 nm, d 221.0 ± 11.0 nm, e 238.1 ± 12.0 nm, f 256.0 ± 12.8 nm

Fig. 2 a-f SEM images of the as-grown NW arrays on substrates presented in Fig. 1, accordingly, g-j schematic diagram demonstrating how morphology and orientation of ZnO NWs evolve with substrate roughness from flat to coarse

Fig. 3 Statistics results of substrate roughness a, average diameter of NWs b, number density of NWs c, relationship between substrate roughness and induced NW averaged diameter and NW number density d

Table 1 Substrate parameters and NW statistic results

Sample	Substrate roughness (nm)	NW average diameter (nm)	NW number density (μm^-2)
1	32.0	32.8	352.3
2	66.3	31.6	346.7
3	103.9	30.5	320.4
4	221.0	30.1	309.0
5	238.1	30.0	298.3
6	256.0	29.1	290.3

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