Acta Metallurgica Sinica (English Letters) ›› 1993, Vol. 6 ›› Issue (11): 379-382.

• Research paper • Previous Articles     Next Articles

PREPARATION OF B-N FILMS BY ION BEAM ASSISTED DEPOSITION

JIANG Hai TAO Kun LI Hengde Tsinghua University,Beijing,China lecturer,Department of Materials Science and Engineering,Tsinghua University,Beijing 100084,China   

  • Received:1993-11-11 Revised:1993-11-11 Online:1993-11-11 Published:2009-10-10

Abstract: BN films,synthesized by ion beam assisted deposition,were analysed by RBS,AES, IR spectra and TEM.Formatiom of c-BN phase was shown not only by IR spectra at absorption peak of 1100 cm~(-1),but also by electron diffraction pattern.The results of AES demonstrate an effect of N~+ implantation near the film surface.The deposited films consist of three layers,i.e.,ion implantation layer,film layer and mixed intermediatelayer, according to the difference of concentration.The micro-Knoop hardness of the film is 25—35 GPa.

Key words: ion beam assisted deposition, BN film