PERFORMANCE AND MICROSTRUCTURE OF SUPERHARD Si_3N_4 FILM BY HIGH POWER CO_2 LASER CVD

Abstract

Abstract: A superhard α-Si_3N_4 film,deposited on metal substrate,was produced by laser chemical vapor deposition adopting a kW-level high power CO_2 laser.Most films are composed of fine Si_3N_4 partieles.They join the metal substrate in strong bond.The films have super hardness,excellent resistance to wear and corrosion,etc.Their thickness may be controlled within 5-30 μm.

Key words: laser chemical vapour deposition, Si_3N-4 film, hardness, wear resistance, corrosion resistance

FENG Zhongchao GUO Liang LIANG Yong HAN Jian HOU Wanliang NING Xiaoguang Institute of Metal Research,Academia Sinica,Shenyang,China Associate Professor,Institute of Metal Research,Academia Sinica,Shenyang 110015,China. PERFORMANCE AND MICROSTRUCTURE OF SUPERHARD Si_3N_4 FILM BY HIGH POWER CO_2 LASER CVD[J]. Acta Metallurgica Sinica (English Letters), 1993, 6(7): 64-68.

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PERFORMANCE AND MICROSTRUCTURE OF SUPERHARD Si_3N_4 FILM BY HIGH POWER CO_2 LASER CVD

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