THE CRYSTALLIZATION KINETICS OF AN AMORPHOUS Ti-RICH NiTi FILM

Acta Metallurgica Sinica (English Letters) ›› 2000, Vol. 13 ›› Issue (6): 1131-1135.

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THE CRYSTALLIZATION KINETICS OF AN AMORPHOUS Ti-RICH NiTi FILM

X. Y. Jiang, H.B. Xu and S.K. Gong (Department of Materials Science and Engineering, Beijing University of Aeronautics and Astronautics,Beijing 100083, China)

Received:2000-12-25 Revised:2000-12-25 Online:2000-10-10 Published:2009-10-10

Abstract

Abstract: The crystallization kinetics of an amorphous Ti-rich NiTi film (Ni 46.34at.%, Ti 53.66at.%)prepared by DC magnetron sputtering was determined by non-isothermal techniques. The activation energy of crystallization and the mean value of the Avrami parameter are 382kJ/mol and 0.85, respectively. The calculated isothermal kinetic curse of amorphous film at 773K coincides with the result of X-ray diffraction.The formation of a Ti2Ni phase is accompanied with the crystallization of Ti-rich NiTi film.

Key words: amorphous NiTi film, crystallization kinetics, activation energy of crystallization

X. Y. Jiang, H.B. Xu and S.K. Gong (Department of Materials Science and Engineering, Beijing University of Aeronautics and Astronautics,Beijing 100083, China). THE CRYSTALLIZATION KINETICS OF AN AMORPHOUS Ti-RICH NiTi FILM[J]. Acta Metallurgica Sinica (English Letters), 2000, 13(6): 1131-1135.

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THE CRYSTALLIZATION KINETICS OF AN AMORPHOUS Ti-RICH NiTi FILM

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