Microstructure, Mechanical, and Tribological Properties of CNx Thin Films Prepared by Reactive Magnetron Sputtering

doi:10.1007/s40195-013-0004-4

金属学报英文版 ›› 2014, Vol. 27 ›› Issue (1): 31-36.DOI: 10.1007/s40195-013-0004-4

收稿日期:2013-05-03 修回日期:2013-08-23 出版日期:2014-02-25 发布日期:2014-03-11

Microstructure, Mechanical, and Tribological Properties of CN_x Thin Films Prepared by Reactive Magnetron Sputtering

Xiangyang Chen¹(), Jin Zhang¹, Shengli Ma², Haixia Hu¹, Zhebo Zhou¹

1. School of Mechanical Engineering, Anhui University of Science and Technology, Huainan, 232001, China
2. State Key Laboratory for Mechanical Behavior of Materials, Xi’an Jiaotong University, Xi’an, 710049, China

Received:2013-05-03 Revised:2013-08-23 Online:2014-02-25 Published:2014-03-11

摘要/Abstract

Abstract:

The microstructure, mechanical, and tribological properties of the carbon nitride (CN_x) thin films with different nitrogen contents deposited on high-speed steel substrates by reactive magnetron sputtering were studied. CN_x films with nitrogen contents from 10.7 to 28.2 at.% had an amorphous structure composing of the carbon bonds of sp²C–C, sp²C–N, and sp³C–N. The TiN inter-layer cause the adhesion of CN_x films enhancement. The more nitrogen concentration led to larger film hardness and friction coefficient against GCr15 steel balls, but the wear rates decreased.

Key words: Reactive magnetron sputtering (RMS), CN_x film, Microstructure, Tribology

. [J]. 金属学报英文版, 2014, 27(1): 31-36.

Xiangyang Chen, Jin Zhang, Shengli Ma, Haixia Hu, Zhebo Zhou. Microstructure, Mechanical, and Tribological Properties of CN_x Thin Films Prepared by Reactive Magnetron Sputtering[J]. Acta Metallurgica Sinica (English Letters), 2014, 27(1): 31-36.

图/表 12

Fig. 1 Schematic diagram of the RMS system

Table 1 Deposition parameters for TiN inter-layer and CNx film deposition

Parameter	TiN inter-layer	CN_x film
Bias voltage (V)	-200	-100
Substrate temperature (°C)	300	250
N₂/Ar ratio	0.3	0.2–0.6
Ti target power (kW)	2	0
Graphite target power (kW)	0	4
Deposition time (min)	30	120

Fig. 2 Composition of the CNx films deposited using different N2/Ar flow ratios

Fig. 3 a Surface SEM micrographs. b Cross-sectional SEM micrograph of the CNx film with 16.9 at.% nitrogen

Fig. 4 XPS spectra acquired from the CNx films with different nitrogen contents: a 10.7 at.%, b 28.2 at.%

Fig. 5 X-ray diffraction patterns of the CNx films with different nitrogen contents deposited on high-speed steel (W18Cr4V) substrates

Fig. 6 HR-TEM images and SAED patterns acquired from the CNx films with different nitrogen contents: a 10.7 at.%, b 28.2 at.%

Fig. 7 Hardness values of the CNx films with various nitrogen contents

Fig. 8 Adhesion comparison of single layer CNx films and CNx films with TiN inter-layer

Fig. 9 Friction coefficients of the CNx films with different nitrogen contents measured in air at room temperature and 45% relative humidity

Fig. 10 Wear tracks on the CNx films with different nitrogen contents: a 10.7 at.%, b 28.2 at.%

Fig. 11 Volume wear rates of the CNx films with various nitrogen contents

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Microstructure, Mechanical, and Tribological Properties of CN_x Thin Films Prepared by Reactive Magnetron Sputtering

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