Role of Substrate Roughness in ZnO Nanowire Arrays Growth by Hydrothermal Approach
Qiu-Hong Wang1,2, Chao-Long Tang1, Cheng-Ming Jiang1, Dan-Feng Du1, Feng Wang1,2, Jin-Hui Song1(
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Fig. 1. AFM measurement for six substrates with different roughness: a 32.0 ± 1.6 nm, b 66.3 ± 3.3 nm, c103.9 ± 5.2 nm, d 221.0 ± 11.0 nm, e 238.1 ± 12.0 nm, f 256.0 ± 12.8 nm
